MUNICH, Germany- SUSS MicroTec, supplier of innovative solutions for the 3D, MEMS, advanced packaging, and nanotechnology markets, has entered a license agreement with Philips Research, Eindhoven/The Netherlands, for a new enabling technology called substrate conformal imprint lithography (SCIL). The aim of this cooperation is to bring an existing equipment platform with this additional Nanoimprinting (NIL) feature to the market, enabling new approaches to large-area imprint applications along with excellent printing resolution and repeatability.
This new imprint technology for sub-50 nm patterning is bridging the gap between small rigid stamp application for best resolution and large-area soft stamp usage with the usual limited printing resolution below 200 nm. SCIL is an enabling technology offering the best of two worlds—large-area soft stamps with repeatable sub-50 nm printing capability, avoiding stamp deformation as no contact force is applied, non-UV based curing at room temperature and allowing high aspect ratios even up to 1:5 and more
The lab aligner platform from SUSS MicroTec, handling the 150 and 200 mm UV-lithography like MA6 and MA8, will be available and upgradeable with this feature. Immediate availability for sampling is given with the current test setup. Market introduction with fully implemented SCIL functionality into SUSS' lab aligners is scheduled for later this year.
"SCIL represents an enabling new technology that paves the way for further commercialization of nanoimprint lithography", said Rolf Wolf, general manager of SUSS MicroTec lithography division. "This collaboration with Philips Research significantly broadens the range of nanoimprint lithography processes we can offer our customers."