Nova Combines Optical CD and X-Ray Measurements into a New Hybrid Metrology Offering

REHOVOT, Israel --- Nova Measuring Instruments introduces a new hybrid metrology concept, which combines measurements from two of its leading metrology platforms - X-Ray and Optical.

With this newly introduced solution, thin film and material parameters (measured on X-Ray metrology platforms) are combined with profile and geometry parameters (measured on Optical CD metrology platforms) for better process control in the most advanced technology nodes. This unique offering utilizes the synergy between the technologies, resulting in superior metrology performance that supports tighter process control schemes for faster time to market. The new hybrid solution relies on Nova's novel optical and X-Ray modeling algorithms and is being evaluated by several key customers.

Additional information may be found at http://www.novameasuring.com
 

Suggested Articles

Bipartisan group of senators also wants user social net data to be portable

Future Apple Watch bands could contain more electrical and data contacts, paving the way to add power sources or sensors.

Broadcom’s Trident silicon family will be used in Extreme gear