Nova and Leti Collaborate to Enhance Process Control Schemes for Advanced Lithography

REHOVOT, Israel --- Leti and Nova Measuring Instruments announce a joint program to develop innovative metrology methods to enable leading-edge process control solutions for multi e-beam and directed self-assembly (DSA) advanced lithography techniques. Based on this new joint initiative, Nova has already installed its advanced suite of products at Leti's state-of-the-art facility in France.

In order to meet the fabrication process challenges at the most advanced technology nodes, several lithography technologies are currently evaluated beyond mainstream multi-patterning optical lithography. The main alternatives to be considered include DSA and multi-beam direct-write lithography (ML2). The joint program between Leti and Nova will focus on developing innovative process-control solutions to address the challenges related to these new patterning methods. The collaboration will utilize Nova's T600 multi-channel stand-alone optical metrology platform combined with its innovative MARS modeling software and the recently introduced Hybrid solution, which combines several measurements from different metrology platforms.

Additional information may be found at:

Suggested Articles

System positions sensors every 40 kilometers connected over LoRaWAN network

The dual camera in the iPhone 11 attracted customers, but also a price lower than the iPhone XR

Despite more WFH, device shipments will drop in 2020 by nearly 14%, according to Gartner