GRENOBLE, France --- Leti has developed a μLED fabrication process to create high-resolution arrays at 10-micron pitch. That pixelization and the 873 x 500 resolution enabled by the new process exceed state-of-the-art technology.
Designed for micro-display applications such as augmented-reality or virtual-reality tools and wearable devices, the blue or green GaN/InGaN µLED arrays use Leti’s proprietary self-aligned technology. That process is key to achieving such a small pixel pitch. A combination of several damascene metallization steps used to create a common cathode is also expected to provide good thermal dissipation and prevent voltage drops within the micro-LED matrix. Electro-optical measurements showcase record efficiency and brightness exceeding requirements for device integration.
For more info, visit http://www.leti.fr/en