The company’s 193-nm XL high-reflectance coating is viable for low-fluence, high-repetition-rate excimer laser applications associated with semiconductor R&D and test. The coating specifies a ≥96% reflectance (45° angle of incidence) to ≥97% reflectance (normal incidence) at 193 nm, making it a suitable choice for micromachining and materials processing applications. It is a multilayer dielectric coating that combines a hybrid structure with balanced stress optimized for excimer laser repetition rates of 4 kHz to 5 kHz. Additionally, the ultraviolet-wavelength coating passes MIL-SPEC adhesion, abrasion, and humidity tests.
Laser Mirror Coating Improves Semiconductor R&D/Test
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