ST. FLORIAN --- EV Group (EVG), together with the Korea National NanoFab Center, announce preliminary results on improved transparent nanostructured anti-reflective coatings for next-generation displays. The ongoing work has been carried out within a joint-development program (JDP) established between the two partners in November 2015. This collaborative research has been partly funded by the Nano-Open-Innovation-Lab Project of the NNFC.
The goal of the EVG-NNFC JDP is the development of optimized materials, the process technology for structure replication, and the industrial implementation of the AR coatings for large-area substrates. The NNFC research team under its director Dr. Jae Hong Park is responsible for the development of the materials and the "reversible nano-molding" process, which can be compatible with EVG's proprietary SmartNIL™ UV-nanoimprint lithography (UV-NIL) technology. EVG is responsible for optimizing the UV-NIL replication process and transferring the technology from the R&D phase on current 200-mm round substrates to large panel sizes.
Outstanding preliminary results
EVG and the NNFC have successfully demonstrated an anti-reflective coating with excellent structure replication that provides over 97-percent transmittance and a surface hardness of 3H, which is superior to most other polymeric coatings. By contrast, current commercial thin-film coatings only provide up to 92-percent transmittance. The JDP partners achieved these results by applying EVG's SmartNIL™ technology on 200-mm round substrates using a polymer material developed by the NNFC. This material was developed for performing the reversible nano molding process at the NNFC, and is compliant with commercial standards for display coating.
In the next phase of the program, EVG and the NNFC plan to promote these promising results to initiate partnerships with end-users that are interested in joining the JDP to help commercialize the new AR coating. The goal of this next phase is the qualification of the novel anti-reflective coating technology for industrial use through the NNFC, and the implementation of the process by EVG to high-volume panel manufacturing on large screen sizes, such as Gen 2 (370 mm x 470 mm) panels and beyond. In addition to this specific project, EVG and the NNFC plan to investigate other application areas leveraging nanostructures and NIL technology.
EVG and the NNFC presented the results of this JDP at the recent NANO KOREA symposium and exhibition in Goyang, Korea. A copy of the poster summarizing the results can be downloaded at http://www.evgroup.com/en/about/news/2016_12_NNFC
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